James Kraus, Senior Coating & Sales Development Engineer
Executive Summary | Thin films exposed to high laser fluence levels benefit from having both high laser damage threshold and low absorption values. The need for high laser damage threshold is clear. Low absorption is also important due to the need to keep the optic from experiencing absorption-based heating effects while in use. Thin film stack absorption under optical load can lead to issues such as thermal lensing and premature failure of the optic. Plasma Process Group has developed the Techne Ion Beam Sputtering deposition tool designed for manufacturing these challenging coatings. Plasma Optik has optimized Techne process parameters to both maximize laser damage threshold and minimize absorption. This paper details the laser damage and absorption testing methods and these methods are discussed. Also included is laser damage and absorption performance data measured by testing of 1064nm and 532nm high reflector mirrors made with the Techne system.